Development history
Development history
Development history
2024.02
Hefei Hisemi is located in Hefei High-tech Zone Tiantangzhai Road No. 66 new factory put into use
2021.06
Hefei Hisemi Semiconductor Co., LTD was established
2020.12
Renamed as Chizhou Hisemi Electronic Technology Co., LTD
05
Hisemi Group headquarters 20000 square meters of factory building, 12 "wafer seal test project formally put into production
2018.10
Wuxi Hisemi Electronic Technology Co., LTD was established
09
Shenzhen Hisemi Semiconductor Co., Ltd was established
01
Acquiring Hefei Huada Semiconductor Co., LTD
01
Acquiring Shenzhen Hisemi Fubao Semiconductor Co., LTD
2017.11
Chizhou Taimeida changed its name to Chizhou Hisemi Electronic Technology Co., LTD., and the company started A-share listing plan
2014.10
Chizhou Taimeida electronic company was formally established
2013.07
Chizhou Huati Semiconductor Co., Ltd. was established with substantial integrated circuit packaging and testing capabilities
05
Hefei Huada Semiconductor Co., LTD was established
2010.03
Shenzhen Hisemi Fubao Semiconductor Co., LTD was established
2008.06
Wuxi Huayu Core Semiconductor Co., LTD was established
2007.03
